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  • Pioneer in Materials Technology,

    Global Leader in Specialty Gases

    Delivering Advanced Specialty Gas Solutions
    through Proprietary Technologies and
    Continuous Innovation

    In alignment with the evolving technology roadmaps of the
    semiconductor and display industries, Hyosung Neochem proactively
    delivers advanced material solutions through the close collaboration of
    its R&D, Sales, and Manufacturing organizations, enabling swift and
    agile responses to market and customer requirements.

    As a global supplier of specialty gases, Hyosung Neochem offers a
    diverse portfolio of high-quality products that support a wide range of
    advanced technology applications.

    Supported by strategically diversified manufacturing facilities in
    Yongyeon and Oksan, Korea, as well as Quzhou, China, the Company has
    established a robust and reliable supply network to ensure
    uninterrupted product availability for customers worldwide.

    Through proprietary technology development and continuous
    investment in research and innovation, Hyosung Neochem has
    successfully developed and commercialized high-purity Nitrogen
    Trifluoride (NF₃) utilizing its own technological expertise.

    The Company's comprehensive specialty gas portfolio includes 20%
    Fluorine/Nitrogen (F₂/N₂), Deuterium (D₂), Propylene (C₃H₆), Chlorine
    (Cl₂), Hydrogen Chloride (HCl), and other high-purity gases designed to
    meet the stringent requirements of the semiconductor and display
    industries.

Product

NF3(Nitrogen Trifluoride)

Nitrogen Trifluoride (NF₃) is manufactured using hydrofluoric acid and ammonia as key raw materials. Leveraging proprietary electrolysis technology and sophisticated cryogenic purification processes, Hyosung Neochem produces ultra-high-purity NF₃ with a purity level of 5N (99.999%). As a critical electronic material for the semiconductor and display industries, NF3 is primarily utilized for CVD chamber cleaning and semiconductor etching processes. Its superior performance and reliability contribute to enhanced process efficiency and productivity in advanced manufacturing environments.

20%F2/N2(Fluorine/Nitrogen Mixture)

Hyosung Neochem manufactures high-purity fluorine gas through proprietary electrolysis technology and utilizes a precisely controlled blending process with ultra-high-purity nitrogen to produce high-purity 20% F2/N2 gas. As a key material for semiconductor fabrication, 20% F2/N2 is widely utilized for chamber cleaning in LP-CVD (Low Pressure Chemical Vapor Deposition) processes. Its exceptional cleaning performance helps optimize equipment productivity, improve process stability, and maintain high manufacturing yields.

D2

After securing a stable supply of heavy water (D2O) as the raw material, we produce high-purity D2 through electrolysis and advanced purification processes. D2 is used as a process gas for the annealing process, which reduces interfacial defects in semiconductor devices and enhances device reliability.

Other Specialty Gases

Propylene (C3H6): High-purity material used for ACL(Amorphous Carbon Layer) deposition as a hard mask in semiconductor lithography processes.
HF Coolant: Cooling material for efficient thermal management of semiconductor etching equipment and data center servers.
C4F7N: Next-generation insulating gas for environmentally friendly power equipment.
Cl2, HCl, N2O, etc